Dr. Dennis W. Mueller, Professor
 
 
  Department of Physics
1155 Union Circle, #311427
Denton, Texas  76203		 (940) 565-4093
Science Research Bldg, 229
mueller@unt.edu
 
   
Education:      

Ph.D., Nebraska, 1988.
Modern physics; quantum mechanics.
 
Research:       Dr. Mueller investigates the interactions of electrons with atoms by scattering electrons and atom beams. He also is playing an active part in the development of a portable X-ray diffraction instrument for application to characterization of metallurgical samples.
 
Publications:        
  1. Effect of low-k surface roughness on subsequent metal layers, Smith, Casey E.; Mueller, D. W.; Matz, P. D.; Reidy, R. F., Advanced Metallization Conference 2006, Proceedings, Tokyo, Japan, Sept. 26-27, and San Diego, CA, United States, Oct. 17-19, 2006 (2007), 425-431.
 
  2. Sol-gel polycondensation of methyltrimethoxysilane in ethanol studied by 29Si NMR spectroscopy using a two-step acid/base procedure. Dong, Hanjiang; Zhang, Zhengping; Lee, Man-Ho; Mueller, D.W.; Reidy, Richard F., Journal of Sol-Gel Science and Technology (2007), 41(1), 11-17.
 
  3. TEMEELS Study on the Ash Damage and Repair of Porous Low-k Films, J Wang, D Cha, PM Matz, CE Smith, DW Mueller, RF Reidy, MJ Kim, Microscopy and Microanalysis, 13, S02 (2007) 794-795.
 
  4. Topographical and Chemical Surface Modification of Porous MSQ Using Silylating Agents with Different Numbers of Methoxy Groups, Casey Smith, Dennis Mueller, Phil Matz, Rick Reidy, Materials Research Society Symposium Proceedings, v 914, Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects, 2006, p 265-271.
 
  5. Analytical TEM Characterization of Metal Penetration and Supercritical Pore-Sealing of Ash-Damaged Porous Low-k Dielectrics, Brian P. Gorman, Dennis Mueller, Oliver Chyan, and R.F. Reidy,Advanced Metallization Conference 2005, Colorado Springs, ed. S.H. Brongersma, T.C. Taylor, M. Tsujimura, K. Masu, p. 393-397.
 
  6. Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying, R. A. Orozco-Teran, B. P. Gorman, D. W. Mueller, M. R. Baklanov and R. F. Reidy, Thin Solid Films, 471, 1-2 (2005) 145-153.
 
  7. Observation of Intrusion Rates of Hexamethyldisilazane During Supercritical Carbon Dioxide Functionalization of Triethoxyfluorosilane Low-k Films, P.M. Capani, P.D. Matz, D.W. Mueller, M.J. Kim, E.R. Walter, J.T. Rhoad, E.L. Busch, R.F. Reidy, Materials, Technology and Reliability of Advanced Interconnects, Editors: Paul R. Besser, Andrew J. McKerrow, Francesca Iacopi, C.P. Wong, Joost Vlassak, MRS Proceedings Volume 863, 2005, B2.7.
 
  8. Shrinkage and Springback Behaviour of Methylsilsesquioxanes Prepared by an Acid/Base Two-Step Processing Procedure Hanjiang Dong, Richard F. Reidy, and John D. Brennan, Chemistry ofMaterials 17, 24 (2005) 6012 – 6017.
 
  9. Dielectric Behavior Of Triethoxyfluorosilane Aerogels, J.A. Roepsch, B.P. Gorman, D.W. Mueller, R.F. Reidy, Journal of Non-Crystalline Solids 336 (2004) 53-58.
 
  10. Synthesis of DAM-1 molecular sieves containing single walled carbon Nanotubes, E. Munoz, D. Coutinho, R.F. Reidy, A. Zakhidov, W.L. Zhou, K.J. Balkus, Microporous And Mesoporous Materials 67 (2004) 61-65.
 .
  11. Rapid Repair of Plasma Ash Damage in Low-k Dielectrics Using Supercritical CO2, B.P. Gorman, R.A. Orozco-Teran, Z. Zhang, P.D. Matz, D.W. Mueller, and R.F. Reidy, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures–Processing, measurement, and Phenomena, 22(3), (2004) 1210-1212.
 
  12. Behavior of Copper Ions in Silica Xerogels, Zhengping Zhang, Hanjiang Dong, B.P. Gorman, D.W. Mueller, and R. F. Reidy, Journal of Non-Crystalline Solids, 341 (2004) 157-161.
 
  13. Reinforcement Mechanism for Mechanically-Enhanced Xerogel Films, Hanjiang Dong, B.P. Gorman, Zhengping Zhang, R.A. Orozco-Teran, J.A. Roepsch, D.W. Mueller, M.J. Kim, R. F. Reidy, Journal of Non-Crystalline Solids, 350 (2004) 345-350.
 
  14. Supercritical Pore Sealing of Porous MSQ, R.F. Reidy, P.K. Nerusu, E.C. Chaung, R.A. Orozco-Teran, P.P. Kadam, P.D. Matz, J.T. Rhoad, E.L. Busch, D.W. Mueller, Advanced Metallization Conference, ed. D. Erb, P. Ramm, K. Masu, A. Osaki, 2004 p.493-497.
 
  15. Drying Methods for Low-k Films and Their Effects on Dielectric Constants, P.M. Capani, B.P. Gorman, R.F. Reidy, D.W. Mueller, E.R. Walter, P. D. Matz J.T. Rhoad, E.L. Busch, Advanced Metallization Conference 2004, ed. D. Erb, P. Ramm, K. Masu, A. Osaki, p.509-513.
 
  16. Supercritical Silylation Of Ashed Si-O-C Low-k Films To Limit Changes In Critical Dimensions, R.F. Reidy, R.A. Orozco-Teran, Zhengping Zhang, Pawan K. Nerusu, P.D. Matz, D.W. Mueller, Advanced Metallization Conference, ed. G.W. Ray, T. Smy, T. Ohta, M. Tsujimura , p.513-517 (2003).
 
  17. Drying and Functionalization of Triethoxyfluorosilane-based Low-k Dielectrics in CO2, B.P. Gorman, D. W. Mueller, R. F. Reidy, Electrochemical and Solid State Letters, 6 [11], F40-41 (2003).
 
  18. Polymerization and Cyclization of Dimethyldiethoxysilane by 29Si NMR and FTIR, Zhengping Zhang, B. P. Gorman, Hanjiang Dong, Rosa A. Orozco-Teran, D.W. Mueller, R.F. Reidy, Journal of Sol-gel Science and Technology 28, 159-165 (2003).
 
  19. Methyltrimethoxysilane Sol-Gel Polymerization in Acidic Ethanol Solutions Studied by 29Si NMR Spectroscopy, Hanjiang Dong, M.H. Lee, R.A. Thomas, Zhengping Zhang, R.F. Reidy, D.W.Mueller, Journal of Sol-Gel Science and Technology, 28, 5-14 (2003).
 
  20. Investigation of the Polymerization and Cyclization of Dimethyldiethoxysilane by 29Si NMR and FTIR, Z. Zhang, B. P. Gorman, H. Dong, D. W. Mueller, and R. F. Reidy, Journal of Sol-Gel Science and Technology, 28, 159 (2003).
 
  21. Gaussian Random Field Models of Aerogels, J. Quintanilla, R.F. Reidy, B.P. Gorman, D.W. Mueller, Journal of Applied Physics 93 [8], 4584-4589 (2003).
 
  22. Effects of Supercritical CO2 Drying and Photoresist Strip on Low-k Films, R.F. Reidy, Zhengping Zhang, R.A. Orozco-Teran, B.P. Gorman, D.W. Mueller, MRS Proceedings Vol 766, Materials, Technology, and Reliabililty for Advance Interconnects and Low-k Dielectrics, Ed. A. McKerrow, J. Leu, O. Kraft, T. Kikkawa, E6.10 (2003), 303-308.
 
  23. Supercritical Carbon Dioxide-based Fluids Used as a Recovery Tool for Low-k Material, R.A. Orozco-Teran, B.P. Gorman, Z. Zhang, D.W. Mueller, and R.F. Reidy, MRS Proceedings Vol 766, Materials, Technology, and Reliabililty for Advance Interconnects and Low-k Dielectrics, Ed. A. McKerrow, J. Leu, O. Kraft, T. Kikkawa, E8.20 (2003), 297-302.
 
  24. Synthesis And Characterization Of Hydrophobic Fluorine Doped Silica Films Zhengping Zhang, Hanjiang Dong, B.P Gorman, Chun Yao, D.W. Mueller, R.F. Reidy, Proceedings to the Electrochemical Society Symposium on "Copper Interconnects, New Contact Metallurgies and Low-k Interlevel Dielectrics", 2002 (Editor: G.S. Mathad), The Electrochemical Society, Inc., p. 170 (2003).
 
  25. Processing of Ultra-Low K Xerogel Composite Films, B.P. Gorman, Shelley Chang, D.W. Mueller, R.F. Reidy, Advanced Metallization Conference, ed. B.M. Melnick, T.S. Cale, S. Zaima, T. Ohta, p. 602-607 (2002).
 
  26. Effects Of Supercritical Processing On Ultra Low-K Films, R.F. Reidy, B.P. Gorman, R.A. Orozco-Teran, Zhengping Zhang, Shelley Chang, D.W. Mueller, Advanced Metallization Conference, ed. B.M. Melnick, T.S. Cale, S. Zaima, T. Ohta, p. 607-612 (2002).
 
  27. High Strength Low Dielectric Constant Fluorinated Silica Xerogel Films, B. P. Gorman, Rosa A. Orozco-Teran, Jodi A. Roepsch, Hanjiang Dong, Richard F. Reidy, and D.W. Mueller, App. Phys. Lett. 79 [24] 4010-1012 (2001).
 
  28. Low Dielectric Constant Functionalized Silica Gels, Brian P. Gorman, Rosa A. Orozco-Teran, Jodi A. Roepsch, Dennis W. Mueller and Richard F. Reidy, , MRS Symp. Proc. Vol. 714E (2001) p. L7.17.1-7. (2001).
 
  29. Processing-mechanical Property Relationships In Ultra-low K Xerogel Films, Richard F. Reidy, B.P. Gorman, Rosa A. Orozco-Teran, Jodi A. Roepsch, Hanjiang Dong, D.W. Mueller, Advanced Metallization Conference, 319-323 (2001).
 
  30. Functionalized Silica Aerogels/Xerogels for Low Dielectric Constant Applications, H. Dong, R.A. Orozco-Teran, J. Roepsch, D.W. Mueller, R.F. Reidy, Thin Film Materials, Processes, and Reliability in Microelectronics, Electrochemical Society Symposium Proceedings, p. 193-203 (2001).
 
  31. Electron Anticapture to the continuum in double-binary electron-atom collisions, D.E.Golden, Z.Xu, J.Bernhard and D.W.Mueller, J. Phys. B, 29 3741-3746 (1996).
 
  32. Anti-capture into the continuum in electron-atom ionization, D.E.Golden, Z.Xu, D.W. Mueller and J. Bernhard, Nuclear Instruments and Methods B, 99 202-204 (1995).
 
  33. Anti-Capture into the Continuum in electron collisional Induced Ionization of Atoms, D.E. Golden, Z. Xu, D.W. Mueller, and J. Bernhard, Nucl. Inst. And Meth. (1994).
 
  34. Investigation of Microstructure and Microhardness Variation Associated With Long-Term Service Exposure of Electrical Turbine Components (A470 and A564 Steels), J. DeAlba, C. S. Niou, L. E. Murr, P. Diehl, R. F. Pinizzotto, E. G. Jacobs, and D. W. Mueller, Proceedings of the XVI Encuentro de Invetigacion Metalurgica, I Congreso Internacional de Materiales, Saltillo, Coahuila, Mexico, October 1994, pp. 593-605.
 
  35. Ion Accelerators and Electron Scattering, D.W. Mueller, J.E. Furst, C.T. Newell, S.M. Pak, C.B. Reddy, R.S. Smith, L. Song, Z. Xu, Y. Zhang, J.X. Zhou, and D.E. Golden, Nuc. Inst. and Meth. B79, 85 (1993).
 
  36. New Techniques for Electron—Ion Collision Studies, D.W. Mueller, B. Chalamala, C.T. Newell, R.S. Smith, Y. Zhang and D.E. Golden, VIth  International Conference on the Physics of Highly-Charged Ions, Eds. P.Richard, M.Stöckli, C.L.Cocke, and C.D.Lin, American Institute of Physics Conference Proceedings, New York 274 505-507 (1993).
 
  37. Three-Body Multiparameter Correlations in Electron-Ion Ionization, D.E. Golden, L. Song, Y. Zhang and D.W. Mueller, VIth International Conference on the Physics of Highly-Charged Ions, Eds. P.Richard, M.Stöckli, C.L.Cocke, and C.D.Lin, American Institute of Physics Conference Proceedings, New York 274 508-511 (1993).
 
  38. Total Cross Sections of Electron Impact Ionization of Ar7+, Y. Zhang, C.B. Reddy, R.S. Smith, D.E. Golden, D.W. Mueller, and D.C. Gregory, Phys. Rev. A, 45 2929-2934 (1992).
 
  39. Measurement of electron-impact single-ionization cross sections of Ar8+, Y.Zhang, C.B.Reddy, R.S.Smith, D.E.Golden, D.W.Mueller, and D.C.Gregory, Phys. Rev. A, 44 4368-4371 (1991).
 
  40. A High Energy Resolution Modulated GaAs Photoelectron Source, J.X. Zhou, D.E. Golden, J.E. Furst and D.W. Mueller, Nuclear Instruments and Methods in Physics Research B56/57, 1171-1172 (1991).
 
  41. Electron-Impact Double Ionization of Xe8+, D.W. Mueller, L.J. Wang, and D.C. Gregory, Physical Review A 39, 2381-2384 (1989).
 
  42. Electron-ion collision cross sections, D.W. Mueller, Nuclear Instruments and Methods in Physics Research, B42, 467-471 (1989).
 
  43. Absolute Low Energy e--Ar Scattering Cross Sections, J.Furst, D.E. Golden, M. Mahgerefteh, J.Zhou, and D.W. Mueller, Phys. Rev. A 40, 5592-5600 (1989).
 
  44.. Test of predicted Δn ≥ 1 L-shell dielectronic-recombination cross sections, E.M. Bernstein, M.W. Clark, J.A. Tanis, W.T. Woodland, K.H. Berkner, A.S. Schlachter, J.W. Stearns, R.D. DuBois, W.G. Graham, T.J. Morgan, D.W. Mueller, and M.P. Stockli, Phys. Rev. A 40, 4085-4088 (1989).
 
  45. Multiple-electron capture in close nearly symmetric ion-atom collisions, A.S. Schalchter, E.M. Bernstein, M.W. Clark, R.D. Dubois, W.G. Graham, R.H. McFarland, T.J. Morgan, D.W. Mueller, K.R. Stalder, J.W. Stearns, M.P. Stöckli, and J.A. Tanis, J. Phys. B 21, L291-L297 (1988).
 
  46. Cross sections for electron-impact single ionization of Kr8+ and Xe8+, M.E. Bannister, D.W. Mueller, L.J. Wang, M.S. Pindzola, D.C. Griffin, and D.C. Gregory, Phys. Rev. A 38, 38-43 (1988).
 
  47. Experimental Measurement of Field Effects of Dielectronic Recombination Cross Sections and Rydberg Product State Distributions, A. Müller, D.S. Belic, B.D. DePaola, N. Djuric, G.H. Dunn, D.W.Mueller, and C. Timmer, Phys. Rev. A 36, 599-613 (1987).
 
  48. Electron-Ion Collisions: Dielectronic Recombination and Ionization, A. Müller, G.H. Dunn, N. Djuric, B.D. DePaola, D.S. Belic, D.W. Mueller, C. Timmer, K. Tinshert, C. Achenbach, G. Hofmann, R. Sauer, E. Salzborn, and R. Becker, Nuclear Instruments and Methods in Physics Research B23, 254-264 (1987).
 
  49. Charge Transfer in High Energy Ion-Atom Collisions, A.S. Schlachter, K.H. Berkner, R.J. McDonald, J.W. Stearns, E.M. Bernstein, M.W. Clark, J.A.Tanis, W.G. Graham, R.H. McFarland, M.P. Stöckli, J.R. Mowat, and D.W. Mueller, Nuclear Instruments and Methods in Physics Research B27, 573-578 (1987).
 
  50. L-Shell Resonant Transfer and Excitation for Ne-like Niobuim Ions, E.M. Bernstein, M.W. Clark, J.A. Tanis, W.G. Graham, R. H. McFarland, J.R. Mowat, D.W.Mueller, M.P. Stockli, K.H. Berkner, R.J. McDonald, A.S. Schlachter, and J.W. Stearns, Nuclear Instruments and Methods B23, 154-156 (1987).
 
  51. K-and L-Shell Resonant Transfer and Excitation in Ion-Atom Collisions, E.M. Bernstein, M.W. Clark, J. A. Tanis, W.G. Graham, R.H. McFarland, T.J. Morgan, J.R. Mowat, D.W. Mueller, M.P. Stöckli, K.H. Berkner, R.J. McDonald, A.S. Schlachter, and J.W. Stearns, Nuclear Instruments and Methods in Physics Research B24, 232-236 (1987).
 
  52. Resonant Electron Transfer and L-Shell excitation for 41Nb31+ and 57La40+ ions, E.M. Bernstein, M.W. Clark, J.A. Tanis, K.H. Berkner, R.J. McDonald, A.S. Schlachter, J.W. Stearns, W.G. Graham, R.H. McFarland, J.J. Morgan, J.R. Mowat, D.W. Mueller, and M.P. Stöckli, J. Phys. B 20, L505-510 (1987).
 
  53. Electron Impact Ionization of B2+ and O5+: Excitation-Autoionization of Li-Like Ions, D.H. Crandall, R.A. Phaneuf, D.C. Gregory, A.M. Howald, D.W. Mueller, T.J. Morgan, G.H. Dunn, and R.J.W. Henry, Phys. Rev. A 34, 1757-1767 (1986).
 
  54. Excitation of the Na 3p state by proton impact, W. Jitschin, S. Osimitsch, D.W. Mueller, H. Reihl, R.J. Allan, O. Schöller, and H.O. Lutz, J Phys. B 19, 2299-2309 (1986).
 
  55. Resonant Transfer and Excitation: Dependence on Projectile Charge State and Target-Electron Momentum Distribution, J.A. Tanis, E.M. Bernstein, M.W. Clark, W.G. Graham, R.H.McFarland, T.J. Morgan, J.R. Mowat, D.W. Mueller, A. Müller, M.P. Stöckli, K.H. Berkner, P. Gohil, R.J. McDonald, A.S. Schlachter, and J.W. Stearns, Phys. Rev. A 34, 2543-2546 (RC) (1986).
 
  56. Spin exchange in the excitation of spin-polarized Na atoms by Ne+-ion impact, W. Jitschin, S. Osimitsch, H. Reihl, D.W. Mueller, H. Kleinpoppen, and H.O. Lutz, Phys. Rev. A 34, 3684-3691 (1986).
 
  57. Field Effects on the Rydberg Product-State Distribution from Dielectronic Recombination, A. Müller, D.S. Belic, B.D. DePaola, N. Djuric, G.H. Dunn, D.W. Mueller, and C. Timmer, Phys. Rev. Lett. 56, 127-130 (1986).
 
  58. Absolute Cross Section Measurements for Electron-Impact Ionization of Twice Charged Ions Ti2+, Fe2+, Ar2+, Cl2+, and F2+, D.W. Mueller, T.J. Morgan, G.H. Dunn, D.C. Gregory, and D.H. Crandall,Phys. Rev. A 31, 2905-2913 (1985).
 
  59. Polarized-Photon--Scattered-Particle Correlation Measurements H+-He Collisions, D.W. Mueller and D.H. Jaecks, Phys. Rev. A 32, 2650-2656 (1985).
 
  60. Dielectronic Recombination: A Crossed-Beam Observation and Measurement of Cross Section, D.S. Belic, G.H. Dunn, T.J. Morgan, D.W. Mueller, and C. Timmer, Phys. Rev. Lett. 50 825-828 (1983).
 
  61. Alignment in Molecular Excitation for 3.22 keV H2+-He Collisions, D.H. Jaecks, O. Yenen, M. Natarajan and D.W. Mueller, Phys. Rev. Lett. 50, 825-828 (1983).
 
  62. Field Effects on Rydberg Product State Distribution From Dielectronic Recombination, in Atomic Excitation and Recombination in External Fields (M.H. Nayfeh and C.W. Clark, Eds., Gordon and Breach, 1985), pp. 405-420.
 
  63. Oak Ridge National Laboratory Report, ORNL/TM-9436, January 1985, M.S. Pindzola, D.C. Griffin, C. Bottcher, D.C. Gregory, A.M. Howard, R.A. Phaneuf, D.H. Crandall, G.H. Dunn, D.W. Mueller, and T.J. Morgan.
 
  64. Oak Ridge National Laboratory Report, ORNL/lM-9501, May 1985, D.C. Gregory, D.H. Crandall, R.A. Phaneuf, A.M. Howald, G.H. Dunn, R.A. Falk, D.W. Mueller, and T.J. Morgan.
 
  65. Alignment and Orientation in Ion-Atom/Molecule Collisions in Electron and Atomic Collision, (S. Datz Ed., North-Holland, 1982), pp. 97-108, D.H. Jaecks, A. Goldberger, M. Natarajan, D.W. Mueller, and D. Montgomery.
 
  66. Dielectronic Recombination of Some Singly Charged Ions, in Electron and Atomic Collisions, (J. Eicher, I.V. Hertel, and N. Stolterfoht, Eds., Elsevier, Amsterdam, 1984), pp. 809-817, Gordon H. Dunn, D.S. Belic, T.J. Morgan, D.W. Mueller, and C. Timmer.
 
  67. Dielectronic Recombination, in Atomic Physics (R.S. Van Dyck and E.N. Fortson, Eds., World Scientific, 1984), pp. 505-522, G. H. Dunn, D. S. Belic, N. Djuric, and D.W.Mueller.
 

For more Information:

You may e-mail Dr. Mueller at mueller@unt.edu

Or send mail to

Department of Physics
1155 Union Circle, #311427
Denton, Texas  76203

(940) 565-4093

Last Updated 26-Sep-2008